Keynotes / Invited Speakers

Keynote Talks

Toshiro Hiramoto (University of Tokyo)
Future Perspectives of CMOS Logic Innovation Beyond 2nm
Ben Kaczer (imec)
Gate Oxide Reliability: Upcoming Trends, Challenges and Opportunities

Daewon Ha (Samsung)
IGZO Channel VCT (Vertical Channel Transistor) Technology for sub-10nm DRAM : Challenges and Opportunities
Yao-Jen Lee (NYCU)
Heterogeneous CFET: A Pathway to CMOS Performance Balance Engineering
Asif Khan (GaTech)
Outlook and Prospects for Ferroelectric Augmentation of Vertical NAND Flash Technology
Shiro Kawabata (AIST)
Integration Technology for Superconducting Quantum Circuits
Hiroaki Arimura (imec)
Interface dipole-based multi-Vt gate stack technology for CFET
Lain-Jong Li (University of Hong Kong)
Potential and challenges of 2D materials based electronics